ULVAC DA-121DE隔膜真空泵可議價

ULVAC DA-121DE隔膜真空泵可議價

ULVAC DA-121DE隔膜真空泵可議價

ULVAC DA-121DE隔膜真空泵產(chǎn)品特性

ULVAC DA-121DE隔膜真空泵應(yīng)用領(lǐng)域

ULVAC DA-121DE隔膜真空泵技術(shù)規(guī)格

ULVAC DA-121DE隔膜真空泵性能參數(shù)

ULVAC DA-121DE 隔膜真空泵相關(guān)信息

ULVAC DA-121DE 一、基本性能參數(shù)

極限壓力：3300(pa) 

抽氣速率：7200(l/s)，換算后50赫茲下120升/分鐘、60赫茲下145升/分鐘

功率：0.4(kw) 

電壓：有100V、115V、200V、220V等規(guī)格，如1φ100V(50/60Hz) 

重量：26(kg) 

外形尺寸：193.5411285 

排出口徑：G1/2(mm) 

ULVAC DA-121DE 二、工作原理與結(jié)構(gòu)特點

原理：隔膜泵，是利用薄橡膠膜(隔膜)的往復(fù)運動進(jìn)行真空排氣的真空泵。

結(jié)構(gòu)特點

構(gòu)造簡單：維保方便，易于維護(hù)。

無油環(huán)境設(shè)計：氣體接觸區(qū)域不使用油，屬于干式真空泵，可避免油污染，適用于對清潔度要求較高的工作環(huán)境，如半導(dǎo)體和電子器件制造設(shè)備相關(guān)的真空排氣系統(tǒng)（刻蝕設(shè)備、去膠設(shè)備、離子清洗設(shè)備等）、真空熱處理爐真空排氣系統(tǒng)（燒結(jié)爐、滲碳爐等）、鋰電池制造設(shè)備真空排氣系統(tǒng)（電極干燥設(shè)備、脫泡設(shè)備、注液設(shè)備等）。

ULVAC DA-121DE 三、應(yīng)用領(lǐng)域

半導(dǎo)體和電子器件制造：在刻蝕設(shè)備、去膠設(shè)備、離子清洗設(shè)備等真空排氣系統(tǒng)中有應(yīng)用，這些設(shè)備在半導(dǎo)體芯片制造過程中對真空環(huán)境要求嚴(yán)格，DA-121DE隔膜真空泵能滿足其需求，保障生產(chǎn)過程順利進(jìn)行。

真空熱處理：例如在燒結(jié)爐、滲碳爐等真空熱處理爐的真空排氣系統(tǒng)中發(fā)揮作用，確保爐內(nèi)達(dá)到所需的真空度，有助于提高熱處理的質(zhì)量和效果。

鋰電池制造：可應(yīng)用于電極干燥設(shè)備、脫泡設(shè)備、注液設(shè)備等鋰電池制造設(shè)備的真空排氣系統(tǒng)，為鋰電池生產(chǎn)過程提供穩(wěn)定的真空環(huán)境，有助于提高鋰電池的性能和質(zhì)量。

ULVAC DA-121DE diaphragm vacuum pump related information

1. Basic performance parameters

Ultimate pressure: 3300(pa)

Pumping rate: 7200 (l/s), converted to 120 liters/minute at 50 Hz and 145 liters/minute at 60 Hz

Power: 0.4(kw)

Voltage: 100V, 115V, 200V, 220V and other specifications, such as 1φ100V (50/60Hz)

Weight: 26(kg)

Overall dimensions: 193.5411285

Discharge diameter: G1/2(mm)

2. Working principle and structural characteristics

Principle: Diaphragm pump is a vacuum pump that uses the reciprocating motion of a thin rubber membrane (diaphragm) to exhaust vacuum.

Structural features

Simple structure: convenient and easy to maintain.

Oil-free environment design: No oil is used in the gas contact area. It is a dry vacuum pump, which can avoid oil pollution. It is suitable for working environments with high requirements for cleanliness, such as vacuum exhaust systems (etching) related to semiconductor and electronic device manufacturing equipment. equipment, degumming equipment, ion cleaning equipment, etc.), vacuum heat treatment furnace vacuum exhaust system (sintering furnace, carburizing furnace, etc.), lithium battery manufacturing equipment vacuum exhaust system (electrode drying equipment, deaeration equipment, liquid injection equipment, etc. ).

3. Application fields

Semiconductor and electronic device manufacturing: It is used in vacuum exhaust systems such as etching equipment, glue removal equipment, and ion cleaning equipment. These equipments have strict vacuum environment requirements during the semiconductor chip manufacturing process. The DA-121DE diaphragm vacuum pump can meet their needs. , to ensure the smooth progress of the production process.

Vacuum heat treatment: For example, it plays a role in the vacuum exhaust system of vacuum heat treatment furnaces such as sintering furnaces and carburizing furnaces to ensure that the required vacuum degree is achieved in the furnace, which helps to improve the quality and effect of heat treatment.

Lithium battery manufacturing: It can be applied to the vacuum exhaust system of lithium battery manufacturing equipment such as electrode drying equipment, deaeration equipment, and liquid injection equipment to provide a stable vacuum environment for the lithium battery production process and help improve the performance and quality of lithium batteries. .

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