ULVAC DA-121DE真空泵隔膜可面談
ULVAC DA-121DE真空泵隔膜可面談
ULVAC DA-121DE真空泵隔膜可面談
ULVAC DA-121DE真空泵隔膜性能
ULVAC DA-121DE真空泵隔膜引腳線
ULVAC DA-121DE真空泵隔膜更換指南
ULVAC DA-121DE真空泵隔膜維修指南
ULVAC DA-121DE真空泵隔膜相關(guān)信息
ULVAC DA-121DE 一、基本性能參數(shù)
極限壓力:3.3×103Pa ,這一參數(shù)表明了該真空泵在理想狀態(tài)下能夠達(dá)到的·低壓力值,反映其在高真空獲取方面的能力。
抽氣速率:在50赫茲時(shí)為120升/分鐘,60赫茲時(shí)為145升/分鐘,抽氣速率體現(xiàn)了真空泵在單位時(shí)間內(nèi)抽取氣體的體積量,不同的頻率下有不同的抽氣效率。
電源:1φ100V(50/60Hz),明確了該真空泵適用的電源規(guī)格,這是設(shè)備正常運(yùn)行的基本電氣條件要求。
質(zhì)量:26公斤,質(zhì)量大小會(huì)影響設(shè)備的搬運(yùn)、安裝以及整體設(shè)備布局中的穩(wěn)定性考慮等方面。
進(jìn)氣管直徑:ODφ×IDφ16.0×12.0,合適的進(jìn)氣管直徑是保障氣體順利進(jìn)入真空泵內(nèi)部進(jìn)行抽取操作的重要參數(shù),與整體的抽氣效率和性能相關(guān)。
ULVAC DA-121DE 二、結(jié)構(gòu)特點(diǎn)
隔膜式設(shè)計(jì):隔膜真空泵是利用薄橡膠膜(隔膜)的往復(fù)運(yùn)動(dòng)進(jìn)行真空排氣的真空泵。這種設(shè)計(jì)使得泵在運(yùn)行過程中具有·特的優(yōu)勢,例如可以減少氣體與泵內(nèi)部其他部件(如潤滑油等)的接觸,從而實(shí)現(xiàn)無油環(huán)境運(yùn)行,這在對清潔度要求較高的應(yīng)用場景(如電子器件制造、實(shí)驗(yàn)室分析等)非常關(guān)鍵。
干泵類型:屬于隔膜型干泵,氣體接觸區(qū)域不使用油的干式真空泵。干式真空泵在很多工藝過程中有重要意義,如在半導(dǎo)體和電子器件制造設(shè)備相關(guān)的真空排氣系統(tǒng)(刻蝕設(shè)備、去膠設(shè)備、離子清洗設(shè)備等)、真空熱處理爐真空排氣系統(tǒng)(燒結(jié)爐、滲碳爐等)、鋰電池制造設(shè)備真空排氣系統(tǒng)(電極干燥設(shè)備、脫泡設(shè)備、注液設(shè)備等)中被廣泛應(yīng)用,因?yàn)榭梢员苊庥蛯に囘^程或者產(chǎn)品造成污染。
ULVAC DA-121DE 三、應(yīng)用領(lǐng)域
電子行業(yè):在半導(dǎo)體和電子器件制造設(shè)備相關(guān)的真空排氣系統(tǒng),如刻蝕設(shè)備、去膠設(shè)備、離子清洗設(shè)備等有著廣泛應(yīng)用。這是因?yàn)槠錈o油的運(yùn)行環(huán)境和較好的真空性能,能夠滿足電子制造過程中對高潔凈度和精·工藝控制的要求。
熱處理領(lǐng)域:用于真空熱處理爐真空排氣系統(tǒng),像燒結(jié)爐、滲碳爐等。在這些設(shè)備中,ULVAC DA-121DE真空泵能夠有效地抽出爐內(nèi)的氣體,維持爐內(nèi)的真空環(huán)境,保證熱處理工藝的順利進(jìn)行和產(chǎn)品質(zhì)量的穩(wěn)定。
鋰電池制造:在鋰電池制造設(shè)備真空排氣系統(tǒng),例如電極干燥設(shè)備、脫泡設(shè)備、注液設(shè)備等方面發(fā)揮作用。由于鋰電池制造過程對環(huán)境的清潔度、干燥度以及真空度有嚴(yán)格要求,該真空泵的特性能夠滿足這些需求。
ULVAC DA-121DE vacuum pump diaphragm related information
1. Basic performance parameters
Ultimate pressure: 3.3×103Pa. This parameter indicates the lowest pressure value that the vacuum pump can reach under ideal conditions, reflecting its ability to obtain high vacuum.
Pumping rate: 120 liters/minute at 50 Hz, 145 liters/minute at 60 Hz. The pumping rate reflects the volume of gas extracted by the vacuum pump per unit time. Different frequencies have different pumping efficiencies.
Power supply: 1φ100V (50/60Hz), which clarifies the power supply specification applicable to the vacuum pump, which is the basic electrical condition requirement for the normal operation of the equipment.
Mass: 26 kg. The mass will affect the handling and installation of the equipment as well as the stability considerations in the overall equipment layout.
Air inlet pipe diameter: ODφ×IDφ16.0×12.0. The appropriate air inlet pipe diameter is an important parameter to ensure that gas can smoothly enter the vacuum pump for extraction operation, and is related to the overall pumping efficiency and performance.
2. Structural characteristics
Diaphragm design: A diaphragm vacuum pump is a vacuum pump that utilizes the reciprocating motion of a thin rubber membrane (diaphragm) for vacuum exhaust. This design gives the pump unique advantages during operation. For example, it can reduce the contact between gas and other components inside the pump (such as lubricating oil, etc.), thereby achieving oil-free operation, which is suitable for applications with high cleanliness requirements. (such as electronic device manufacturing, laboratory analysis, etc.) are very critical.
Dry pump type: It is a diaphragm dry pump, a dry vacuum pump that does not use oil in the gas contact area. Dry vacuum pumps are of great significance in many processes, such as vacuum exhaust systems related to semiconductor and electronic device manufacturing equipment (etching equipment, degumming equipment, ion cleaning equipment, etc.), vacuum heat treatment furnace vacuum exhaust systems (sintering Furnace, carburizing furnace, etc.), lithium battery manufacturing equipment vacuum exhaust system (electrode drying equipment, degassing equipment, liquid injection equipment, etc.) is widely used because it can avoid oil contamination of the process or product.
3. Application fields
Electronics industry: It is widely used in vacuum exhaust systems related to semiconductor and electronic device manufacturing equipment, such as etching equipment, glue removal equipment, ion cleaning equipment, etc. This is because its oil-free operating environment and good vacuum performance can meet the requirements for high cleanliness and precise process control in the electronics manufacturing process.
Heat treatment field: used in vacuum exhaust systems of vacuum heat treatment furnaces, such as sintering furnaces, carburizing furnaces, etc. Among these equipment, ULVAC DA-121DE vacuum pump can effectively extract the gas in the furnace, maintain the vacuum environment in the furnace, and ensure the smooth progress of the heat treatment process and the stability of product quality.
Lithium battery manufacturing: plays a role in the vacuum exhaust system of lithium battery manufacturing equipment, such as electrode drying equipment, degassing equipment, liquid injection equipment, etc. Since the lithium battery manufacturing process has strict requirements on environmental cleanliness, dryness and vacuum, the characteristics of this vacuum pump can meet these requirements.
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